Established K. Hattori,
the present-day Seiko Holdings Corporation.
1881
Established Daini Seikosha Co., Ltd.,
the present-day Seiko Instruments Inc.
1937
Began CMOS IC R&D. 1968
Completed the 2-inch line for development. 1970
1970
Completed the 4-inch line
for the wafer process.
1979 1979 Analog quartz ICs
1980
1982 Driver ICs
1983 Voltage regulators
Voltage detectors
1984 Magnetism sensor ICs
1985 Temperature sensor ICs Real-time clock ICs
1986 Non-volatile memories
Completed the 6-inch line
for the wafer process.
1987
1990
1990 Real-time clock ICs
1993 Lithium-ion battery protection ICs
EEPROM
Began the post process at the Akita plant. 1996 1996 Operational amplifiers, comparators
1999 Lithium-ion battery protection ICs
(secondary protection)
2000
Ultra-small packages (SNT) 2003 2003 EEPROM for automotive use
2005 Ultra-low voltage operation charge pumps
High power dissipation packages (HSOP-6) 2009 2009 Power supply ICs for automotive use
2010
Ultra-small 0.8 x 0.8 mm packages (HSNT) 2011
2012 Photo detect ICs
2013 Magnetism sensor ICs for automotive use
2014 Timer ICs for automotive use
2016.1
Establishment of SII Semiconductor Corporation

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